IP Library Assignment 010156/0810
Patent Assignment
Reel/Frame 010156/0810

Change of Name

Recorded: 1999-08-10 Pages: 4
Assignor
Assignee
ARCH SPECIALTY CHEMICALS, INC.
501 MERRITT 7, NORWALK, CONNECTICUT, 06856
Covered Property (1)
Method for Removing Photoresist and Plasma Etch Residues
Patent: 6,245,155 →
Application: 09/055,630 →
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 1, 1999
From: LEON, VINCENT G.; HONDA, KENJI; ROTHGERY, EUGENE F.
To: OLIN MICROELECTRONIC CHEMICALS, INC.
Reel/Frame 010156/0228 →
Change of Name Jan 10, 2000
From: OLIN MICROELECTRIC CHEMICALS, INC.
To: ARCH SPECIALTY CHEMICAL, INC.
Reel/Frame 010522/0798 →
Merger Apr 29, 2008
From: ARCH SPECIALTY CHEMICALS, INC.
To: FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
Reel/Frame 020866/0493 →