IP Library Assignment 011662/0642
Patent Assignment
Reel/Frame 011662/0642

Assignment of Assignor's Interest

Recorded: 2001-03-28 Pages: 2
Assignors
YAMASHITA, HIROSHI
Executed: 2001-03-22
KOBA, FUMIHIRO
Executed: 2001-03-22
Assignee
NEC CORPORATION
7-1 SHIBA 5 CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Electron Beam Exposure Mask and Pattern Designing Method Thereof
Patent: 6,447,960 →
Application: 09/819,806 →
Publication: US 2001/0028984
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Feb 25, 2003
From: NEC CORPORATION
To: NEC ELECTRONICS CORPORATION
Reel/Frame 013774/0295 →