Patent Assignment
Reel/Frame 011726/0745
Assignment of Assignor's Interest
Recorded: 2001-04-19
Pages: 2
Assignors
ITOGA, KENJI
Executed: 2001-03-29
KITAYAMA, TOYOKI
Executed: 2001-03-29
WATANABE, YUTAKA
Executed: 2001-03-29
UZAWA, SHUNICHI
Executed: 2001-03-29
Assignees
MITSUBISHI DENKI KABUSHIKI KAISHA
2-3, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO 100-8310, JAPAN
CANON KABUSHIKI KAISHA
30-2, SHIMOMARUKO 3-CHOME, OHTA-KU, TOKYO 146-8501, JAPAN
Covered Property
(1)
X-Ray Exposure Apparatus, X-Ray Exposure Method, X-Ray Mask, X-Ray Mirror, Synchrotron Radiation Apparatus, Synchrotron Radiation Method and Semiconductor Device