X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device
View Patent ↗An X-ray exposure apparatus comprises an X-ray mirror containing a material having an absorption edge only in at least either one of a wavelength region of less than 0.45 nm and a wavelength region exceeding 0.7 nm as to X-rays.
1. An X-ray exposure apparatus, comprising:
a first stage X-ray mirror, and
a second stage X-ray mirror, wherein
α represents an angle of oblique incidence of an X-ray incident on said first stage X-ray mirror and said second stage X-ray mirror,
Lα represents a distance between said first and second stage X-ray mirrors, Lα has a same direction of an optical axis of the X-ray incident on said first stage X-ray mirror,
D represents a distance from incidence of an optical axis of the X-ray incident on said first stage X-ray mirror to said second stage X-ray mirror, and has a direction of an axis orthogonal to the optical axis of the X-ray incident on said first stage X-ray mirror and along a plane defined by the optical axis of the X-ray incident on said first stage mirror and an X-ray reflected from said first stage mirror, and
said α and Lα are changed to satisfy a relationship D=Lα×tan(2α), whereby
a spectral distribution of an X-ray outgoing from said second stage is changed, wherein
the direction of the optical axis of the X-ray incident on said first stage X-ray mirror is substantially identical to a direction of the optical axis of the X-ray output from the second stage X-ray mirror.
2. An X-ray exposure apparatus, comprising:
a first stage X-ray mirror,
a second stage X-ray mirror, and
a third stage X-ray mirror, wherein
α represents an angle of oblique incidence of an X-ray incident on said first stage X-ray mirror and said third stage X-ray mirror,
2α represents an angle of oblique incidence of an X-ray incident on said second stage X-ray mirror,
L represents a distance between said first and second stage X-ray mirrors and a distance between said second and third stage X-ray mirrors, L has a same direction of an optical axis of the X-ray incident on said first stage X-ray mirror,
Dα represents a distance from incidence of an optical axis of the X-ray incident on said first stage X-ray mirror to said second stage X-ray mirror, and has a direction of an axis along the optical axis of the X-ray incident on said first stage X-ray mirror and orthogonal to a plane defined by the optical axis of the X-ray incident on said first stage mirror and an X-ray reflected from said first stage mirror, and
said α and Dα are changed to satisfy a relationship Dα=L×tan(2α), whereby
a spectral distribution of an X-ray outgoing from said third stage is changed, wherein
the direction of the optical axis of the X-ray incident on said first stage X-ray mirror is substantially identical to a direction of the optical axis of the X-ray output from the third stage X-ray mirror.
3. An X-ray exposure apparatus, comprising:
a first stage X-ray mirror,
a second stage X-ray mirror,
a third stage X-ray mirror, and
a fourth stage X-ray mirror, wherein
α represents an angle of oblique incidence of an X-ray incident on each of said first, second, third, and fourth stage X-ray mirrors,
L represents a distance between said first and second stage X-ray mirrors and a distance between said third and fourth stage X-ray mirrors, L has a same direction of an optical axis of the X-ray incident on said first stage X-ray mirror,
Dα represents a distance from incidence of an optical axis of the X-ray incident on said first stage X-ray mirror to said third and fourth stage X-ray mirrors, and has a direction of an axis orthogonal to the optical axis of the X-ray incident on said first stage X-ray mirror and along a plane defined by the optical axis of the X-ray incident on said first stage mirror and an X-ray reflected from said first stage mirror, and
said α and Dα are changed to satisfy a relationship Dα=L×tan(2α), whereby
a spectral distribution of an X-ray outgoing from said fourth stage is changed, wherein
the direction of the optical axis of the X-ray incident on said first stage X-ray mirror is substantially identical to a direction of the optical axis of the X-ray output from the fourth stage X-ray mirror.
4. An X-ray exposure apparatus, comprising:
a first stage X-ray mirror,
a second stage X-ray mirror,
a third stage X-ray mirror, and
a fourth stage X-ray mirror, wherein
α represents an angle of oblique incidence of an X-ray incident on each of said first and fourth stage X-ray mirrors,
β represents and angle of oblique incidence of an X-ray incident on each of said second and third stage X-ray mirrors,
Lα represents a distance between said first and second stage X-ray mirrors and a distance between said third and fourth stage X-ray mirrors, as seen along an x-axis corresponding to a direction of the X-ray incident on said first stage X-ray mirror,
Lβ represents a distance between said second and third stage X-ray mirrors, as seen along said x-axis,
D represents a distance between said second and third stage X-ray mirrors, as seen along a y-axis corresponding to a direction perpendicular to said x-axis, and
said α, β, Lα and Lβ are changed to satisfy a relationship D=2×Lα×tan(2α)=β×tan 2(β−α), whereby
a spectral distribution of an X-ray outgoing from said fourth stage is changed, wherein
the direction of the optical axis of the X-ray incident on said first stage X-ray mirror is substantially identical to a direction of the optical axis of the X-ray output from the fourth stage X-ray mirror.
5. An X-ray exposure method employing an X-ray exposure apparatus including two X-ray mirrors including first and second stage X-ray mirrors, comprising the steps of
changing a spectral distribution, rendering substantially identical a direction of an optical axis of an X-ray incident on said first stage X-ray mirror and a direction of an optical axis of an X-ray outgoing from said second stage X-ray mirror, and also changing a spectral distribution of the X-ray outgoing from said second stage X-ray mirror, by changing α and Lα to satisfy a relationship D=Lα×tan(2α), wherein α represents an angle of oblique incidence of an X-ray incident on said first and second stage X-ray mirrors, Lα represents a distance between said first and second stage X-ray mirrors as seen along an x axis corresponding to a direction of the X-ray incident on said first stage X-ray mirror, and D represents a distance from incidence of an optical axis of the X-ray incident on said first stage X-ray mirror to said second stage X-ray mirror, as seen along a y axis corresponding to a direction perpendicular to said x axis;
causing an X-ray incident on said first stage X-ray mirror; and
exposing to an X-ray outgoing from said first stage X-ray mirror via said second stage X-ray mirror.
6. An X-ray exposure method employing an X-ray exposure apparatus including three X-ray mirrors including first, seconds and third stage X-ray mirrors, comprising the steps of:
changing a spectral distribution, rendering substantially identical an optical axis of an X-ray incident on said first stage X-ray mirror and an optical axis of an X-ray outgoing from said third stage X-ray mirror, and also changing a spectral distribution of the X-ray outgoing from said third stage X-ray mirror, by changing α and Dα to satisfy a relationship Dα=L×tan(2α), wherein α represents an angle of oblique incidence of an X-ray incident on said first and third stage X-ray mirrors, 2α represents an angle of oblique incidence of an X-ray incident on said second stage X-ray mirror, L represents a distance between said first and second stage X-ray mirrors and a distance between said second and third stage X-ray mirrors, as seen along an x axis corresponding to a direction of the X-ray incident on said first stage X-ray mirror and Dα represents a distance from incidence of an optical axis of the X-ray incident on said first stage X-ray mirror to said second stage X-ray mirror, as seen along a y axis corresponding to a direction perpendicular to said x axis;
causing an X-ray incident on said first stage X-ray mirror; and
exposing to an X-ray outgoing from said first stage X-ray mirror via said second and third stage X-ray mirrors.
7. An X-ray exposure method employing an X-ray exposure apparatus including four X-ray mirrors including first, second, thirds and fourth stage X-ray mirrors, comprising the steps of:
changing a spectral distribution, rendering substantially identical an optical axis of an X-ray incident on said first stage X-ray mirror and an optical axis of an X-ray outgoing from said fourth stage X-ray mirror, and also changing a spectral distribution of the X-ray outgoing from said fourth stage X-ray mirror, by changing α and Dα to satisfy a relationship DαL×tan(2α), wherein α represents an angle of oblique incidence of an X-ray incident on each of said four X-ray mirrors, L represents a distance between said first and second stage X-ray mirrors and a distance between said third and fourth stage X-ray mirrors, as seen along an x axis corresponding to a direction of the X-ray incident on said first stage X-ray mirror, and Dα represents a distance from incidence of an optical axis of the X-ray incident on said first stage X-ray mirror to said third and fourth stage X-ray mirrors, as seen along a y axis corresponding to a direction perpendicular to said x axis;
causing an X-ray incident on said first stage X-ray mirror; and
exposing to an X-ray outgoing from said first stage X-ray mirror via said second to fourth stage X-ray mirrors.
8. An X-ray exposure method employing an X-ray exposure apparatus including four X-ray mirrors including first, second, third, and fourth stage X-ray mirrors, comprising the steps of:
changing a spectral distribution, rendering substantially identical an optical axis of an X-ray incident on said first stage X-ray mirror and an optical axis of an X-ray outgoing from said fourth stage X-ray mirror, and also changing a spectral distribution of the X-ray outgoing from said fourth stage X-ray mirror, by changing α, β, Lα, and Lβ to satisfy a relationship D=2×Lα×tan(2α)=Lβ×tan 2(β−α), wherein α represents an angle of oblique incidence of an X-ray incident on each of said first and fourth stage X-ray mirrors, β represents an angle of oblique incidence of an X-ray incident on each of said second and third stage X-ray mirrors, Lα represents a distance between said first and second stage X-ray mirrors and a distance between said third and fourth stage X-ray mirrors, as seen along an x axis corresponding to a direction of the X-ray incident on said first stage X-ray mirror, Lβ represents a distance between said second and third stage X-ray mirrors, as seen along said x axis, and D represents a distance between said second and third stage X-ray mirrors, as seen along a y axis corresponding to a direction perpendicular to said x axis;
causing an X-ray incident on said first stage X-ray mirror; and
exposing to an X-ray outgoing from said first stage X-ray mirror via said second to fourth stage X-ray mirrors.