IP Library Assignment 011732/0302
Patent Assignment
Reel/Frame 011732/0302

Assignment of Assignor's Interest

Recorded: 2001-04-19 Pages: 3
Assignor
TOUNAI, KEIICHIRO
Executed: 2001-04-13
Assignee
NEC CORPORATION
MINATO-KU, 7-1, SHIBA 5-CHOME, TOKYO, JAPAN
Covered Property (1)
Photomask Pattern Shape Correction Method and Corrected Photomask
Patent: 6,519,759 →
Application: 09/837,957 →
Publication: US 2001/0034877
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Feb 19, 2003
From: NEC CORPORATION
To: NEC ELECTRONICS CORPORATION
Reel/Frame 013745/0188 →