Patent Application
Utility
App. No. 09/837,957
· Confirmation No. 1234
PHOTOMASK PATTERN SHAPE CORRECTION METHOD AND CORRECTED PHOTOMASK
Inventor:
Keiichiro Tounai
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-04-19 | TRNA |
Transmittal of New Application | 2 | View | |
| 2001-04-19 | A.PE |
Preliminary Amendment | 3 | View | |
| 2001-04-19 | SPEC |
Specification | 11 | View | |
| 2001-04-19 | CLM |
Claims | 7 | View | |
| 2001-04-19 | ABST |
Abstract | 1 | View | |
| 2001-04-19 | DRW |
Drawings-only black and white line drawings | 7 | View | |
| 2001-04-19 | OATH |
Oath or Declaration filed | 2 | View |
Inventors
Keiichiro Tounai
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
716/19
Prosecution
- Examiner
- PHAN, TRONG Q
- Art Unit
- 2818
- Customer No.
- 26304
- Docket No.
- NECU 18.601
- Confirmation No.
- 1234
Foreign Priority
123702/2000
·
2000-04-19
·
JAPAN
Publication
- Pub. No.
- US20010034877A1
- Pub. Date
- 2001-10-25
Patent Term Adjustment
-54days
No related applications found.
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-19
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Quick Facts
- App. No.
- 09/837,957
- Filed
- 2001-04-19
- Granted
- 2003-02-11
- Pub. No.
- US20010034877A1
- Examiner
- PHAN, TRONG Q
- Art Unit
- 2818
- PTA
- -54 days
External Links