Patent Assignment
Reel/Frame 011886/0930
Assignment of Assignor's Interest
Recorded: 2001-06-08
Pages: 2
Assignors
SHIMAZU, HIROMI
Executed: 2001-02-16
IWASAKI, TOMIO
Executed: 2001-02-19
OHTA, HIROYUKI
Executed: 2001-02-16
MIURA, HIDEO
Executed: 2001-02-19
IKEOA, SHUJI
Executed: 2001-03-09
Assignee
HITACHI, LTD.
6, KANDA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Semiconductor Device Having Cobalt Silicide Film in Which Diffusion of Cobalt Atoms Is Inhibited and Its Production Process
Patent:
6,686,274 →
Application:
09/787,743 →
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Corrective Assignment to Correct the Name of Inventor That Was Previously Recorded on Reel 01186, Frame 0930.
Apr 15, 2002
From: SHIMAZU, HIROMI; IWASAKI, TOMIO; OHTA, HIROYUKI; MIURA, HIDEO
To: HITACHI, LTD.
Reel/Frame 012788/0737 →
Assignment of Assignor's Interest
Sep 26, 2003
From: HITACHI, LTD.
To: RENESAS TECHNOLOGY CORPORATION
Reel/Frame 014569/0585 →
Merger/Change of Name
Aug 31, 2011
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 026837/0505 →