IP Library Assignment 012294/0407
Patent Assignment
Reel/Frame 012294/0407

Assignment of Assignor's Interest

Recorded: 2001-11-02 Pages: 3
Assignors
MINAMIHABA, GAKU
Executed: 2001-10-12
YANO, HIROYUKI
Executed: 2001-10-12
KURASHIMA, NOBUYUKI
Executed: 2001-10-12
KAWAHASHI, NOBUO
Executed: 2001-10-12
HATTORI, MASAYUKI
Executed: 2001-10-12
NISHIMOTO, KAZUO
Executed: 2001-10-12
Assignees
KABUSHIKI KAISHA TOSHIBA
1-1 SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
JSR CORPORATION
11-24, TSUKIJI 2-CHOME, CHUO-KU, TOKYO, JAPAN
Covered Property (1)
Slurry for Chemical Mechanical Polishing and Method of Manufacturing Semiconductor Device
Patent: 6,924,227 →
Application: 09/932,943 →
Publication: US 2002/0023389
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043727/0167 →