Patent Assignment
Reel/Frame 012299/0836
Assignment of Assignor's Interest
Recorded: 2001-11-07
Pages: 2
Assignor
KOIKE, OSAMU
Executed: 2001-09-13
Assignee
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.
292 YOSHIDA-CHO, TOTSUKA-KU, YOKOHAMA, KANAGAWA, 244-0, JAPAN
Covered Property
(1)
Plasma Etching Apparatus with Focus Ring and Plasma Etching Method
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.