Assignment of Assignor's Interest

Recorded: 2001-11-26 Pages: 2

Assignor

YAMANA, MITSUHARU

Executed: 2001-11-14

Assignee

NEC CORPORATION

7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN

Covered Property (1)

Resist resins, chemically amplified resist composition, and process for the formation of a pattern

Application: 09/991,691 →

Publication: US 2002/0098442

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.