Patent Application
Utility
App. No. 09/991,691
· Confirmation No. 3931
Resist resins, chemically amplified resist composition, and process for the formation of a pattern
Inventor:
Mitsuharu Yamana
Abandoned -- Failure to Respond to an Office Action
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-11-26 | TRNA |
Transmittal of New Application | 2 | View | |
| 2001-11-26 | ADS |
Application Data Sheet | 1 | View | |
| 2001-11-26 | A.PE |
Preliminary Amendment | 5 | View | |
| 2001-11-26 | SPEC |
Specification | 27 | View | |
| 2001-11-26 | CLM |
Claims | 7 | View | |
| 2001-11-26 | ABST |
Abstract | 1 | View | |
| 2001-11-26 | OATH |
Oath or Declaration filed | 2 | View |
Inventors
Mitsuharu Yamana
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
430/270.1
Prosecution
- Examiner
- THORNTON, YVETTE C
- Art Unit
- 1752
- Customer No.
- 466
- Docket No.
- NEC01P224
- Confirmation No.
- 3931
Foreign Priority
2000-357781
·
2000-11-24
·
JAPAN
Publication
- Pub. No.
- US20020098442A1
- Pub. Date
- 2002-07-25
No related applications found.
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-05-02
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Quick Facts
- App. No.
- 09/991,691
- Filed
- 2001-11-26
- Pub. No.
- US20020098442A1
- Examiner
- THORNTON, YVETTE C
- Art Unit
- 1752
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