Patent Assignment
Reel/Frame 012672/0995
Assignment of Assignor's Interest
Recorded: 2002-03-05
Pages: 3
Assignor
ITOH, MASAMITSU
Executed: 2002-02-25
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1 SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Manufacturing Method for Exposure Mask, Generating Method for Mask Substrate Information , Mask Substrate, Exposure Mask, Manufacturing Method for Semiconductor Device and Server
Patent:
6,537,844 →
Application:
10/087,860 →
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
Merger
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
Change of Name and Address
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
Change of Name and Address
Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →