IP Library Granted Patent US 6,537,844
Granted Patent Utility
US 6,537,844 · Confirmation No. 8351

MANUFACTURING METHOD FOR EXPOSURE MASK, GENERATING METHOD FOR MASK SUBSTRATE INFORMATION , MASK SUBSTRATE, EXPOSURE MASK, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND SERVER

Inventor: Masamitsu Itoh
Patented Case View Patent ↗
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Code Description Pages PDF
2002-03-05 TRNA Transmittal of New Application 3 View
2002-03-05 SPEC Specification 42 View
2002-03-05 CLM Claims 10 View
2002-03-05 ABST Abstract 1 View
2002-03-05 DRW Drawings-only black and white line drawings 6 View
2002-03-05 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,537,844
App. No.
10/087,860
Filed
2002-03-05
Granted
2003-03-25
Art Unit
2818
PTA
-54 days