IP Library Assignment 012733/0337
Patent Assignment
Reel/Frame 012733/0337

Assignment of Assignor's Interest

Recorded: 2002-03-28 Pages: 2
Assignors
HAYANO, KATSUYA
Executed: 2001-11-27
HASEGAWA, NORIO
Executed: 2001-11-27
Assignee
HITACHI, LTD.
6, KANDA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Method of Manufacturing Photomask and Method of Manufacturing Semiconductor Integrated Circuit Device
Patent: 6,824,958 →
Application: 10/025,457 →
Publication: US 2002/0102476
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 26, 2003
From: HITACHI, LTD.
To: RENESAS TECHNOLOGY CORPORATION
Reel/Frame 014569/0585 →
Merger and Change of Name Sep 9, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024964/0180 →