IP Library Assignment 012752/0954
Patent Assignment
Reel/Frame 012752/0954

Assignment of Assignor's Interest

Recorded: 2002-04-02 Pages: 2
Assignors
HAMANAKA, NOBUAKI
Executed: 2002-03-25
YOKOYAMA, TAKASHI
Executed: 2002-03-25
SHIBA, KAZUTOSHI
Executed: 2002-03-25
ODA, NORIAKI
Executed: 2002-03-25
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME MINATO-KU, TOKYO,, JAPAN
Covered Property (1)
Photo Mask for Fabricating Semiconductor Device Having Dual Damascene Structure
Patent: 6,821,687 →
Application: 10/112,716 →
Publication: US 2002/0142235
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest May 2, 2003
From: NEC CORPORATION
To: NEC ELECTRONICS CORPORATION
Reel/Frame 013622/0981 →
Change of Name Dec 13, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025486/0530 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →