Assignment of Assignor's Interest

Recorded: 2002-06-06 Pages: 7

Assignors

LI, JIUTAO

Executed: 2002-05-22

MCTEER, ALLEN

Executed: 2002-05-23

HERDT, GREGORY

Executed: 2002-05-22

DOAN, TRUNG T.

Executed: 2002-05-22

Assignee

MICRON TECHNOLOGY, INC.

8000 SOUTH FEDERAL WAY, BOISE, IDAHO, 83707

Covered Property (1)

Co-Sputter Deposition of Metal-Doped Chalcogenides

Patent: 6,890,790 →

Application: 10/164,429 →

Publication: US 2003/0228717

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.