Patent Assignment
Reel/Frame 013622/0800
Assignment of Assignor's Interest
Recorded: 2002-12-30
Pages: 3
Assignors
MIZUSHIMA, KAZUKI
Executed: 2001-07-23
SHIONO, ICHIRO
Executed: 2001-07-23
YAMAGUCHI, KENJI
Executed: 2001-07-23
Assignees
MITSUBISHI MATERIALS CORPORATION
5-1, OTEMACHI 1-CHOME, CHIYODA-KU, TOKYO, JAPAN
MITSUBISHI MATERIALS SILICON CORPORATION
5-1, OTEMACHI 1-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Semiconductor Substrate, Field Effect Transistor, Method of Forming Sige Layer and Method of Forming Strained Si Layer Using Same, and Method of Manufacturing Field Effect Transistor
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Apr 5, 2011
From: MITSUBISHI MATERIALS SILICON CORPORATION
To: SUMITOMO MITSUBISHI SILICON CORPORATION
Reel/Frame 026074/0552 →
Change of Name
Apr 7, 2011
From: SUMITOMO MITSUBISHI SILICON CORPORATION
To: SUMCO CORPORATION
Reel/Frame 026100/0718 →
Assignment of Assignor's Interest
Oct 5, 2011
From: MITSUBISHE MATERIALS CORPORATION
To: SUMCO CORPORATION
Reel/Frame 027021/0207 →