IP Library › Assignment 013646/0216
Patent Assignment
Reel/Frame 013646/0216

Assignment of Assignor's Interest

Recorded: 2003-01-08 Pages: 3
Assignor
TAMADA, NAOHISA
Executed: 2002-12-12
Assignee
MITSUBISHI DENKI KABUSHIKI KAISHA
2-3, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO, 100-8310, JAPAN
Covered Property (1)
Method of Pattern Layout of a Photomask for Pattern Transfer
Patent: 6,869,735 →
Application: 10/338,004 →
Publication: US 2004/0018434
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 10, 2003
From: MITSUBISHI DENKI KABUSHIKI KAISHA
To: RENESAS TECHNOLOGY CORP.
Reel/Frame 014502/0289 →
Assignment of Assignor's Interest Apr 7, 2004
From: MITSUBISHI DENKI KABUSHIKI KAISHA
To: RENESAS TECHNOLOGY CORP.
Reel/Frame 015185/0122 →
Change of Name Sep 8, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 024953/0237 →