Patent Assignment
Reel/Frame 013689/0001
Assignment of Assignor's Interest
Recorded: 2003-05-29
Pages: 5
Assignor
ASML US, INC.
Executed: 2003-02-11
Assignee
ASML NETHERLANDS B.V.
DE RUN 1110, LA VELDHOVEN, 5503, NETHERLANDS
Covered Properties
(4)
Method, System, and Apparatus for Management of Reaction Loads in a Lithography System
Two-part cover for protecting a reticle, system including and method of using the same
Application:
60/358,354 →
System and method for registration of a two-part cover for protecting a reticle
Application:
60/364,129 →
Reticle cover, pod, and handler systems and methods
Application:
60/414,358 →
Related Assignments
(5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Mar 12, 2002
From: GALBURT, DANIEL N.
To: ASML US INC.
Reel/Frame 012693/0108 →
Assignment of Assignor's Interest
Jun 12, 2002
From: DEL PUERTO, SANTIAGO E.; LOOPSTRA, ERIK R.
To: ASML US, INC.
Reel/Frame 012992/0247 →
Assignment of Assignor's Interest
Aug 27, 2002
From: DEL PUERTO, SANTIAGO E.; LOOPSTRA, ERIK R.; MASSAR, ANDREW; KISH, DUANE P.
To: ASML US, INC.
Reel/Frame 013232/0827 →
Assignment of Assignor's Interest
Feb 19, 2004
From: DEL PUERTO, SANTIAGO E.; MASSAR, ANDREW; KISH, DUANE P.; ALIKHAN, ABDULLAH
To: ASML HOLDING N.V.
Reel/Frame 014347/0358 →
Assignment of Assignor's Interest
Apr 20, 2004
From: ASML NETHERLANDS, B.V.
To: ASML HOLDING N.V.
Reel/Frame 014513/0938 →