IP Library › Assignment 013772/0228
Patent Assignment
Reel/Frame 013772/0228

Assignment of Assignor's Interest

Recorded: 2003-02-19 Pages: 3
Assignors
LIM, KWAN-YONG
Executed: 2002-01-24
CHO, HEUNG-JAE
Executed: 2002-01-24
PARK, DAE-GYU
Executed: 2002-07-24
CHA, TAE-HO
Executed: 2002-07-24
YEO, IN-SEOK
Executed: 2002-01-24
Assignee
HYNIX SEMICONDUCTOR INC.
SAN 136-1, AMI-RI, BUBAL-EUB, ICHON-SHI, 467-860, KOREA, REPUBLIC OF
Covered Property (1)
Method for Fabricating Semiconductor Devices Having Dual Gate Oxide Layers
Patent: 7,157,339 →
Application: 10/292,296 →
Publication: US 2003/0100155