IP Library Assignment 014424/0822
Patent Assignment
Reel/Frame 014424/0822

Assignment of Assignor's Interest

Recorded: 2003-08-22 Pages: 2
Assignors
KURITA, HISATSUGU
Executed: 2003-06-09
HIRASAWA, MANABU
Executed: 2003-06-09
NAGAHAMA, HIROMI
Executed: 2003-06-09
IZUMOME, KOJI
Executed: 2003-06-09
INO, TAKAO
Executed: 2003-06-17
YAMABE, JYUNSEI
Executed: 2003-06-17
HAYAMIZU, NAOYA
Executed: 2003-06-23
SAKURAI, NAOAKI
Executed: 2003-06-20
Assignee
TOSHIBA CERAMICS CO., LTD.
5-25, NISHI-SHINJUKU 7-CHOME, SHINJUKU-KU, TOKYO 160-0023, JAPAN
Covered Property (1)
Silicon Wafer Cleaning Method
Patent: 7,226,513 →
Application: 10/645,911 →
Publication: US 2004/0045580
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Jul 5, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019511/0735 →
Assignment of Assignor's Interest Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →