Patent Assignment
Reel/Frame 014425/0277
Assignment of Assignor's Interest
Recorded: 2003-08-22
Pages: 3
Assignee
ANELVA CORPORATION
8-1, YOTSUVA 5-CHOME, FUCHU-SHI, TOKYO, JAPAN
Covered Property
(1)
Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the method
Application:
10/645,908 →
Publication:
US 2006/0276055
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.