Patent Assignment
Reel/Frame 021701/0140
Change of Name
Recorded: 2008-10-20
Pages: 13
Assignor
ANELVA CORPORATION
Executed: 2005-10-01
Assignee
CANON ANELVA CORPORATION
2-5-1, KURIGI, ASAO-KU, KAWASAKI-SHI, KANAGAWA, JAPAN
Covered Properties
(26)
Surface processing apparatus
Application:
10/234,540 →
Publication:
US 2003/0047282
Substrate Processing Apparatus
Method of Cleaning a Cvd Device
Application:
10/709,622 →
Publication:
US 2004/0194708
Film-forming method for forming metal oxide on substrate surface
Application:
10/808,348 →
Publication:
US 2004/0191426
Sputtering system
Application:
10/852,148 →
Publication:
US 2005/0011756
Plasma-Assisted Sputter Deposition System
Multi-cathode ionized physical vapor deposition system
Application:
10/949,335 →
Publication:
US 2005/0115827
Double-Layer Shutter Control Method of Multi-Sputtering System
Method of Depositing a Higher Permittivity Dielectric Film
Substrate Processing Apparatus And Substrate Processing Method Using Such Substrate Processing Apparatus
Application:
11/161,293 →
Publication:
US 2006/0027166
A Magnetoresistance Effect Device and a Preform Therefor
Manufacturing Apparatus of Magnetoresistance Elements
Thin-Film Disposition Apparatus
Application:
11/834,717 →
Publication:
US 2008/0017500
Surface Processing Apparatus
Application:
11/845,135 →
Publication:
US 2008/0053614
Film Forming Apparatus
Plasma processing apparatus
Application:
10/704,884 →
Publication:
US 2004/0149216
Surface processing apparatus
Application:
10/211,367 →
Publication:
US 2003/0024478
Electrostatic Chuck Device
Method of operating substrate processing device
Application:
10/505,544 →
Publication:
US 2005/0255717
Anticorrosive vacuum sensor
Application:
09/798,959 →
Publication:
US 2002/0019711
Heating element CVD system and heating element CVD method using the same
Application:
10/293,698 →
Publication:
US 2003/0131795
Apparatus and method for manufacturing halogen gas and halogen gas recovery and circulatory system
Application:
10/642,619 →
Publication:
US 2004/0035691
Method of forming an oxygen- or nitrogen-terminated silicon nanocrystalline structure and an oxygen- or nitrogen-terminated silicon nanocrystalline structure formed by the method
Application:
10/645,908 →
Publication:
US 2006/0276055
Film-forming system and film-forming method
Application:
10/662,339 →
Publication:
US 2004/0050328
Thin-Film Disposition Apparatus
Interback-Type Substrate Processing Device
Related Assignments
(19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Mar 6, 2001
From: MIYASHITA, HARUZO; ESASHI, MASAYOSHI; KITAMURA, YASUYUKI
To: ANELVA CORPORATION; ESASHI, MASAYOSHI
Reel/Frame 011612/0385 →
Assignment of Assignor's Interest
Aug 5, 2002
From: EGAMI, AKIHIRO; IKEDA, MASAYOSHI; SAGO, YASUMI; NAKAGAWA, YUKITO
To: ANELVA CORPORATION
Reel/Frame 013172/0762 →
Assignment of Assignor's Interest
Sep 5, 2002
From: SAGO, YASUMI; IKEDA, MASAYOSHI; KANEKO, KAZUAKI; KONDO, DAISUKE
To: ANELVA CORPORATION
Reel/Frame 013261/0589 →
Assignment of Assignor's Interest
Jan 27, 2003
From: KARASAWA, MINORU; ISHIBASHI, KEIJI; TANAKA, MASAHIKO
To: ANELVA CORPORATION
Reel/Frame 013697/0491 →
Assignment of Assignor's Interest
Feb 28, 2003
From: SAGO, YASUMI; IKEDA, MASAYOSHI; KANEKO, KAZUAKI; OKADA, TAKUJI
To: ANELVA CORPORATION
Reel/Frame 013822/0103 →
Assignment of Assignor's Interest
Oct 9, 2003
From: MIZUNO, SHIGERU; ISHIHARA, MASAHITO; WICKRAMANAYAKA, SUNIL; MIYAZAKI, NAOKI
To: ANELVA CORPORATION
Reel/Frame 014037/0927 →
Assignment of Assignor's Interest
Nov 10, 2003
From: OSADA, TOMOAKI; NOZAKI, YOSHIKAZU
To: ANELVA CORPORATION
Reel/Frame 014693/0113 →
Assignment of Assignor's Interest
Mar 25, 2004
From: KUMAGAI, AKIRA; ZHANG, HONG
To: ANELVA CORPORATION
Reel/Frame 015145/0968 →
Assignment of Assignor's Interest
Sep 22, 2004
From: SHIBAMOTO, MASAHIRO; YAMANAKA, KAZUTO; WATANABE, NAOKI
To: ANELVA CORPORATION
Reel/Frame 015814/0250 →
Assignment of Assignor's Interest
Jan 11, 2005
From: WICKRAMANAYAKA, SUNIL
To: ANELVA CORPORATION
Reel/Frame 015551/0601 →
Assignment of Assignor's Interest
Jan 31, 2005
From: FURUKAWA, SHINJI; SHIBAMOTO, MASAHIRO
To: ANELVA CORPORATION
Reel/Frame 015634/0789 →
Assignment of Assignor's Interest
Feb 1, 2005
From: WICKRAMANAYAKA, SUNIL; WATANABE, NAOKI
To: ANELVA CORPORATION
Reel/Frame 016224/0033 →
Assignment of Assignor's Interest
Mar 14, 2005
From: TAKAHASHI, NOBUYUKI
To: ANELVA CORPORATION
Reel/Frame 016726/0291 →
Assignment of Assignor's Interest
Mar 14, 2005
From: NOMURA, SHUJI; MIYOSHI, AYUMU; MIKI, HIROSHI
To: ANELVA CORPORATION
Reel/Frame 016380/0835 →
Assignment of Assignor's Interest
Jul 28, 2005
From: KUMAGAI, AKIRA
To: ANELVA CORPORATION
Reel/Frame 016324/0340 →
Assignment of Assignor's Interest
Aug 11, 2005
From: MAEHARA, HIROKI; OSADA, TOMOAKI; DOI, MIHOKO; TSUNEKAWA, KOJI
To: ANELVA CORPORATION
Reel/Frame 016391/0220 →
Assignment of Assignor's Interest
Aug 15, 2005
From: WICKRAMANAYAKA, SUNIL; YAMADA, NAOKI
To: ANELVA CORPORATION
Reel/Frame 016637/0953 →
Assignment of Assignor's Interest
Aug 24, 2005
From: KITADA, TORU; WATANABE, NAOKI; TAKAGI, SHINJI; FURUKAWA, SHINJI
To: ANELVA CORPORATION
Reel/Frame 016445/0812 →
Assignment of Assignor's Interest
Aug 7, 2007
From: TANAKA, MASAHIKO; IKEMOTO, MANABU; YOKOGAWA, NAOAKI
To: ANELVA CORPORATION
Reel/Frame 019655/0493 →