Patent Assignment
Reel/Frame 014494/0378
Assignment of Assignor's Interest
Recorded: 2003-09-12
Pages: 2
Assignors
TAKAHASHI, SEIICHIRO
Executed: 2003-05-20
IKEDA, MAKOTO
Executed: 2003-05-20
WATANABE, HIROSHI
Executed: 2003-05-20
Assignee
MITSUI MINING & SMELTING CO., LTD.
1-11-1 OSAKI, SHINAGAWA-KU, TOKYO, 141-8584, JAPAN
Covered Property
(1)
Sputtering Target for Forming High-Resistance Transparent Conductive Film, and Method for Producing the Film