Patent Assignment
Reel/Frame 014512/0898
Assignment of Assignor's Interest
Recorded: 2003-09-13
Pages: 2
Assignors
SHIMIZU, AKIHIRO
Executed: 2003-02-13
OOKI, NAGATOSHI
Executed: 2003-02-20
NONAKA, YUSUKE
Executed: 2003-02-28
ICHINOSE, KATSUHIKO
Executed: 2003-02-28
Assignees
HITACHI, LTD.
6, KANDA SURGUADAI, 4-CHOME, CHIYODA-KU, TOKYO, JAPAN
HITACHI ULSI LYSTEMS CO. LTD.
2-1, JOSUIHONCHO 5-CHOME,KODAIRA-SHI, TOKYO, JAPAN
Covered Property
(1)
Semiconductor device including stress inducing films formed over N-channel and P-channel field effect transistors and a method of manufacturing the same
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Apr 18, 2004
From: HITACHI, LTD.
To: RENESAS TECHNOLOGY CORP.
Reel/Frame 015257/0286 →
Assignment of Assignor's Interest
Sep 29, 2006
From: HITACHI, LTD.; HITACHI ULSI SYSTEMS CO.
To: RENESAS TECHNOLOGY CORP.
Reel/Frame 018337/0382 →
Merger
Jul 30, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025204/0512 →
Change of Address
Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →