IP Library Assignment 014638/0264
Patent Assignment
Reel/Frame 014638/0264

Assignment of Assignor's Interest

Recorded: 2003-10-22 Pages: 4
Assignors
AOKI, EIJI
Executed: 2003-10-08
KOBAYASHI, SHINJI
Executed: 2003-10-08
MARUMO, TOSHIYUKI
Executed: 2003-10-16
AKIMA, SHINJI
Executed: 2003-10-16
Assignees
SHARP KABUSHIKI KAISHA
22-22, NAGAIKE-CHO, ABENO-KU, OSAKA-SHI, OSAKA, 545-8522, JAPAN
TOPPAN PRINTING CO., LTD.
5-1, TAITO 1-CHOME, TAITO-KU, TOKYO, 110-8560, JAPAN
Covered Property (1)
Photomask Defect Testing Method, Photomask Manufacturing Method and Semiconductor Integrated Circuit Manufacturing Method
Patent: 7,037,627 →
Application: 10/689,666 →
Publication: US 2004/0086791
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Company Split Sep 12, 2022
From: TOPPAN INC.
To: TOPPAN PHOTOMASK CO.,LTD.
Reel/Frame 061388/0555 →
Change of Name Sep 12, 2022
From: TOPPAN PRINTING CO., LTD.
To: TOPPAN INC.
Reel/Frame 061407/0182 →