IP Library Assignment 061388/0555
Patent Assignment
Reel/Frame 061388/0555

Company Split

Recorded: 2022-09-12 Pages: 8
Assignor
TOPPAN INC.
Executed: 2022-04-01
Assignee
TOPPAN PHOTOMASK CO.,LTD.
3-19-26, SHIBAURA, MINATO-KU, TOKYO, JAPAN
Covered Properties (30)
Photomask Defect Testing Method, Photomask Manufacturing Method and Semiconductor Integrated Circuit Manufacturing Method
Patent: 7,037,627 →
Application: 10/689,666 →
Publication: US 2004/0086791
Phase Shift Mask Blank, Phase Shift Mask, and Pattern Transfer Method
Patent: 7,351,505 →
Application: 10/968,886 →
Publication: US 2005/0112477
Halftone Phase Shift Mask Blank, Halftone Phase Shift Mask, and Pattern Transfer Method
Patent: 7,556,892 →
Application: 11/093,295 →
Publication: US 2005/0244722
Photomask Blank, Photomask and Fabrication Method Thereof
Patent: 7,625,676 →
Application: 11/255,135 →
Publication: US 2006/0088774
Half-Tone Stacked Film, Photomask-Blank, Photomask and Fabrication Method Thereof
Patent: 7,625,677 →
Application: 11/346,224 →
Publication: US 2006/0177746
Photomask Blank, Photomask and Fabrication Method Thereof
Patent: 7,771,893 →
Application: 11/489,477 →
Publication: US 2007/0020534
Photomask Blank and Photomask
Patent: 7,691,546 →
Application: 11/662,183 →
Publication: US 2008/0063950
Photomask Blank, Photomask and Method for Producing Those
Patent: 7,618,753 →
Application: 11/662,479 →
Publication: US 2007/0259276
Photomask Blank and Photomask
Patent: 7,767,366 →
Application: 11/715,346 →
Publication: US 2007/0212618
Photomask Blank and Photomask Making Method
Patent: 7,767,367 →
Application: 11/715,368 →
Publication: US 2007/0212619
Photomask Blank
Patent: 7,790,339 →
Application: 11/785,689 →
Publication: US 2007/0248897
Reflection Type Photomask Blank, Manufacturing Method Thereof, Reflection Type Photomask, and Manufacturing Method of Semiconductor Device
Patent: 8,394,558 →
Application: 12/232,757 →
Publication: US 2009/0042110
Photomask Blank and Photomask
Patent: 8,007,964 →
Application: 12/709,116 →
Publication: US 2010/0143831
Photomask Blank and Photomask Making Method
Patent: 7,989,124 →
Application: 12/820,908 →
Publication: US 2010/0261099
Photomask Blank and Photomask
Patent: 8,003,284 →
Application: 12/820,918 →
Publication: US 2010/0261100
Photomask Blank and Photomask
Patent: 8,012,654 →
Application: 12/820,927 →
Publication: US 2010/0261101
Verification and modification method of rules of do-not-inspect regions, computer program, and apparatus for such verification and modification
Patent: 9,201,296 →
Application: 12/926,496 →
Publication: US 2011/0071783
Photomask Blank and Making Method, Photomask, Light Pattern Exposure Method, and Design Method of Transition Metal/Silicon Base Material Film
Patent: 8,475,978 →
Application: 13/228,501 →
Publication: US 2012/0064438
Reflective Photomask and Reflective Photomask Blank
Patent: 8,962,220 →
Application: 13/262,321 →
Publication: US 2012/0021344
Light Pattern Exposure Method, Halftone Phase Shift Mask, and Halftone Phase Shift Mask Blank
Patent: 8,753,786 →
Application: 13/682,188 →
Publication: US 2013/0130159
Light Pattern Exposure Method, Photomask, and Photomask Blank
Patent: 8,753,787 →
Application: 13/682,228 →
Publication: US 2013/0130160
Reflective Mask and Method for Manufacturing Same
Patent: 9,285,672 →
Application: 14/187,885 →
Publication: US 2014/0170536
Mask Blank for Reflection-Type Exposure, and Mask for Reflection-Type Exposure
Patent: 9,442,364 →
Application: 14/221,994 →
Publication: US 2014/0205936
Reflective Photomask and Production Method Therefor
Patent: 9,927,692 →
Application: 15/057,548 →
Publication: US 2016/0178997
Reflective Mask, Reflective Mask Blank, and Manufacturing Method Therefor
Application: 15/138,960 →
Publication: US 2017/0306475
Photomask Blank, Photomask, and Photomask Manufacturing Method
Application: 16/578,938 →
Publication: US 2020/0012185
Reflective Photomask Blank and Reflective Photomask
Application: 16/625,652 →
Publication: US 2020/0218143
Reflective Photomask Blank and Reflective Photomask
Application: 16/626,290 →
Publication: US 2020/0159106
Reflective Photomask Blank and Reflective Photomask
Application: 17/292,409 →
Publication: US 2022/0011662
Reflective Photomask Blank and Reflective Photomask
Application: 17/615,083 →
Publication: US 2022/0221784
Related Assignments (14)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 22, 2003
From: AOKI, EIJI; KOBAYASHI, SHINJI; MARUMO, TOSHIYUKI; AKIMA, SHINJI
To: SHARP KABUSHIKI KAISHA; TOPPAN PRINTING CO., LTD.
Reel/Frame 014638/0264 →
Assignment of Assignor's Interest Feb 1, 2005
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; OKAZAKI, SATOSHI; HARAGUCHI, TAKASHI
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 016214/0157 →
Assignment of Assignor's Interest Jul 18, 2005
From: YOSHIKAWA, HIROKI; ISHIHARA, TOSHINOBU; OKAZAKI, SATOSHI; INAZUKI, YUKIO
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 016780/0186 →
Assignment of Assignor's Interest Jan 4, 2006
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; KINASE, YOSHINORI; OKAZAKI, SATOSHI
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 017423/0859 →
Assignment of Assignor's Interest Apr 5, 2006
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; KINASE, YOSHINORI; OKAZAKI, SATOSHI
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 017750/0446 →
Assignment of Assignor's Interest Sep 7, 2006
From: YOSHIKAWA, HIROKI; KUBOTA, HIROSHI; KINASE, YOSHINORI; OKAZAKI, SATOSHI
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 018278/0720 →
Assignment of Assignor's Interest Mar 8, 2007
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; OKAZAKI, SATOSHI; HARAGUCHI, TAKASHI
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 019038/0706 →
Assignment of Assignor's Interest Mar 8, 2007
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; OKAZAKI, SATOSHI; HARAGUCHI, TAKASHI
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 019037/0760 →
Assignment of Assignor's Interest Mar 8, 2007
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; OKAZAKI, SATOSHI; HARAGUCHI, TAKASHI
To: TOPPAN PRINTING CO., LTD.; SHIN-ETSU CHEMICAL CO., LTD.
Reel/Frame 019076/0009 →
Assignment of Assignor's Interest Mar 12, 2007
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; KINASE, YOSHINORI; OKAZAKI, SATOSHI
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 019049/0433 →
Assignment of Assignor's Interest Apr 19, 2007
From: YOSHIKAWA, HIROKI; INAZUKI, YUKIO; OKAZAKI, SATOSHI; HARAGUCHI, TAKASHI
To: SHIN-ETSU CHEMICAL CO., LTD.; TOPPAN PRINTING CO., LTD.
Reel/Frame 019278/0196 →
Assignment of Assignor's Interest Sep 23, 2008
From: MATSUO, TADASHI; KANAYAMA, KOICHIRO; TAMURA, SHINPEI
To: TOPPAN PRINTING CO., LTD.
Reel/Frame 021655/0826 →
Assignment of Assignor's Interest Nov 22, 2010
From: KAGEYAMA, KIYOSHI
To: TOPPAN PRINTING CO., LTD.
Reel/Frame 025454/0255 →
Change of Name Sep 12, 2022
From: TOPPAN PRINTING CO., LTD.
To: TOPPAN INC.
Reel/Frame 061407/0182 →