IP Library › Assignment 021655/0826
Patent Assignment
Reel/Frame 021655/0826

Assignment of Assignor's Interest

Recorded: 2008-09-23 Pages: 2
Assignors
MATSUO, TADASHI
Executed: 2008-09-08
KANAYAMA, KOICHIRO
Executed: 2008-09-08
TAMURA, SHINPEI
Executed: 2008-09-08
Assignee
TOPPAN PRINTING CO., LTD.
5-1, TAITO 1-CHOME, TAITO-KU, TOKYO, JAPAN
Covered Property (1)
Reflection Type Photomask Blank, Manufacturing Method Thereof, Reflection Type Photomask, and Manufacturing Method of Semiconductor Device
Patent: 8,394,558 →
Application: 12/232,757 →
Publication: US 2009/0042110
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Company Split Sep 12, 2022
From: TOPPAN INC.
To: TOPPAN PHOTOMASK CO.,LTD.
Reel/Frame 061388/0555 →
Change of Name Sep 12, 2022
From: TOPPAN PRINTING CO., LTD.
To: TOPPAN INC.
Reel/Frame 061407/0182 →