Reflective photomask and reflective photomask blank
Provided is a reflective photomask reflecting an EUV light and used to irradiate a reflected light to a transfer sample, the reflective photomask including: a substrate; a high reflection part formed on the substrate; and a low reflection part formed on the high reflection part and being patterned, wherein the low reflection part, being patterned, includes at least one or more layers being stacked; and at least one layer of the low reflection part, being patterned, includes a layer including an Sn and an oxygen.
1. A reflective photomask reflecting an EUV light and used to irradiate a reflected light to a transfer sample, the reflective photomask comprising:
a substrate;
a high reflection part formed on the substrate; and
a low reflection part formed and patterned on the high reflection part, wherein
the patterned low reflection part comprises a first layer of a SnO film and a second layer including Ru;
the first layer is stacked on the second layer;
a total combined thickness of the first layer and the second layer is 25 nm to 45 nm;
the first layer is amorphous (noncrystalline);
the first layer has an atomic ratio of the oxygen with reference to the Sn (O/Sn) that is 1.0 to 1.5; and
a first reflected light from the patterned low reflection part has a phase difference of 175 to 185 degrees with reference to a second reflected light from the high reflection part.
2. The reflective photomask according to claim 1 , wherein the second layer further comprises oxygen.
3. The reflective photomask according to claim 1 , wherein a first reflectance of the patterned low reflection part with reference to an incident ultraviolet ray having a wavelength of 190 nm to 260 nm, is less than or equal to 15%.
4. The reflective photomask according to claim 3 , wherein an uppermost layer of the patterned low reflection part is the first layer of a SnO film.
5. The reflective photomask according to claim 3 , wherein:
the patterned low reflection part comprises two or more layers being stacked; and
an uppermost layer of the patterned low reflection part is a second layer comprising Si and nitrogen.
6. The reflective photomask according to claim 3 , wherein:
the patterned low reflection part comprises two or more layers being stacked; and
an uppermost layer of the patterned low reflection part is a second layer comprising Si and oxygen.
7. A reflective photomask blank used to form a reflective photomask, the reflective photomask blank comprising:
a substrate;
a high reflection part layer formed on the substrate; and
a low reflection part layer laminated on the high reflection part layer, wherein
the low reflection part layer comprises a first layer of a SnO film and a second layer including Ru, the first layer being stacked on the second layer,
a total combined thickness of the first layer and the second layer is 25 nm to 45 nm,
the first layer is amorphous (noncrystalline),
the first layer has an atomic ratio of the oxygen with reference to the Sn (O/Sn) is 1.0 to 1.5; and
the reflective photomask blank is to be patterned for providing a first reflected light from the low reflection part having a phase difference of 175 to 185 degrees with reference to a second reflected light from the high reflection part.