IP Library › Assignment 016214/0157
Patent Assignment
Reel/Frame 016214/0157

Assignment of Assignor's Interest

Recorded: 2005-02-01 Pages: 5
Assignors
YOSHIKAWA, HIROKI
Executed: 2004-11-30
INAZUKI, YUKIO
Executed: 2004-11-30
OKAZAKI, SATOSHI
Executed: 2004-11-30
HARAGUCHI, TAKASHI
Executed: 2004-11-30
FUKUSHIMA, YUICHI
Executed: 2004-11-30
II, YOSHIHIRO
Executed: 2004-11-30
SAGA, TADASHI 11302004
Executed: 2004-11-30
Assignees
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
TOPPAN PRINTING CO., LTD.
5-1, TAITO 1-CHOME, TAITO-KU, TOKYO, JAPAN
Covered Property (1)
Phase Shift Mask Blank, Phase Shift Mask, and Pattern Transfer Method
Patent: 7,351,505 →
Application: 10/968,886 →
Publication: US 2005/0112477
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Company Split Sep 12, 2022
From: TOPPAN INC.
To: TOPPAN PHOTOMASK CO.,LTD.
Reel/Frame 061388/0555 →
Change of Name Sep 12, 2022
From: TOPPAN PRINTING CO., LTD.
To: TOPPAN INC.
Reel/Frame 061407/0182 →