IP Library Assignment 014817/0997
Patent Assignment
Reel/Frame 014817/0997

Assignment of Assignor's Interest

Recorded: 2003-12-17 Pages: 3
Assignors
CHEN, SHENG-WEN
Executed: 2003-09-19
JANGJIAN, SHIU-KO
Executed: 2003-09-19
CHANG, HUNG-JUI
Executed: 2003-09-19
WANG, YING-LANG
Executed: 2003-09-19
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.
NO. 6. LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, R.O.C., TAIWAN
Covered Property (1)
Method for Cleaning a Plasma Enhanced Cvd Chamber
Patent: 7,207,339 →
Application: 10/738,740 →
Publication: US 2005/0133059