Assignment of Assignor's Interest

Recorded: 2004-01-13 Received: 2004-01-20 Pages: 6

Assignor

MATRIX INTEGRATED SYSTEMS, INC.

Executed: 2003-11-30

Assignee

EXCELIS TECHNOLOGIES, INC.

108 CHERRY HILL DRIVE, ATTN: PATENT LAW DEPARTMENT, BEVERLY, MA, 01915, UNITED STATES

Covered Properties (8)

Method of Heating a Substrate in a Variable Temperature Process Using a Fixed Temperature Chuck

Application: 10/660,359 →

Gas tube end cap for a microwave plasma generator

Application: 10/651,433 →

Dual chamber vacuum processing system

Application: 10/624,728 →

Wide temperature range chuck system

Application: 60/469,050 →

Helix coupled remote plasma source

Application: 60/444,612 →

Method for Producing Flat Wafer Chucks

Application: 10/223,226 →

Apparatus for Increased Workpiece Throughput

Application: 10/167,937 →

Method for Increased Workpiece Throughput

Application: 10/170,621 →