IP Library Assignment 015029/0270
Patent Assignment
Reel/Frame 015029/0270

Assignment of Assignor's Interest

Recorded: 2004-02-26 Pages: 3
Assignor
KAITO, TAKASHI
Executed: 2004-02-13
Assignee
SII NANO TECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, JAPAN
Covered Property (1)
Beam Shaped Film Pattern Formation Method
Patent: 6,740,368 →
Application: 10/001,333 →
Publication: US 2002/0127352
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →