IP Library Assignment 015111/0376
Patent Assignment
Reel/Frame 015111/0376

Assignment of Assignor's Interest

Recorded: 2002-11-20 Pages: 5
Assignors
OHMI, TADAHIRO
Executed: 2002-10-17
HIRAYAMA, MASAKI
Executed: 2002-10-17
SUGAWA, SHIGETOSHI
Executed: 2002-10-17
GOTO, TETSUYA
Executed: 2002-10-17
Assignees
TADAHIRO OHMI
1-17-301, KOMEGAFUKURO 2-CHOME, AOBA-KU, SENDAI-SHI, MIYAGI 980-0813, JAPAN
TOKYO ELECTON LIMITED
3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO 107-8481, JAPAN
Covered Property (1)
Device and Method for Plasma Processing, and Slow-Wave Plate
Patent: 7,083,701 →
Application: 10/296,619 →
Publication: US 2004/0134613
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Security Agreement Mar 19, 2003
From: MEMC ELECTRONIC MATERIALS, INC.; MEMC PASADENA, INC.; PLASMASIL, L.L.C.; SIBOND, L.L.C.
To: CITICORP USA, INC.
Reel/Frame 013964/0378 →