Patent Assignment
Reel/Frame 015133/0973
Assignment of Assignor's Interest
Recorded: 2004-03-24
Pages: 3
Assignors
NISHIMOTO, KAZUO
Executed: 2003-11-25
SAKANO, TATSUAKI
Executed: 2003-11-25
TAKEMURA, AKIHIRO
Executed: 2003-11-25
HATTORI, MASAYUKI
Executed: 2003-11-25
KAWAHASHI, NOBUO
Executed: 2003-11-25
MIYASHITA, NAOTO
Executed: 2003-11-25
SHIGETA, ATSUSHI
Executed: 2003-11-25
MATSUI, YOSHITAKA
Executed: 2003-11-25
IDA, KAZUHIKO
Executed: 2003-11-25
Assignees
JSR CORPORATION
6-10, TSUKIJI 5-CHOME, CHUO-KU, TOKYO, 104-0045, JAPAN
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 105-8001, JAPAN
Covered Property
(1)
Aqueous Dispersion for Chemical Mechanical Polishing, Chemical Mechanical Polishing Process, Production Process of Semiconductor Device and Material for Preparing an Aqueous Dispersion for Chemical Mechanical Polishing
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Sep 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043727/0167 →
Merger
Jan 20, 2022
From: TOSHIBA MEMORY CORPORATION
To: K.K.PANGEA
Reel/Frame 058788/0338 →
Change of Name
Apr 6, 2022
From: K.K.PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 059619/0200 →
Change of Name
Apr 7, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 059649/0647 →