Patent Assignment
Reel/Frame 059649/0647
Change of Name
Recorded: 2022-04-07
Pages: 97
Assignor
TOSHIBA MEMORY CORPORATION
Executed: 2019-10-01
Assignee
KIOXIA CORPORATION
1-21, SHIBAURA 3-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(2)
Method and Device for Plasma-Etching Organic Material Film
Aqueous Dispersion for Chemical Mechanical Polishing, Chemical Mechanical Polishing Process, Production Process of Semiconductor Device and Material for Preparing an Aqueous Dispersion for Chemical Mechanical Polishing
Related Assignments
(5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Mar 24, 2004
From: NISHIMOTO, KAZUO; SAKANO, TATSUAKI; TAKEMURA, AKIHIRO; HATTORI, MASAYUKI
To: JSR CORPORATION; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 015133/0973 →
Assignment of Assignor's Interest
Mar 7, 2006
From: HONDA, MASANOBU; MATSUYAMA, SHOICHIRO; NAGASEKI, KAZUYA; HAYASHI, HISATAKA
To: TOKYO ELECTRON LIMITED; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 017958/0933 →
Assignment of Assignor's Interest
Sep 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043727/0167 →
Merger
Jan 20, 2022
From: TOSHIBA MEMORY CORPORATION
To: K.K.PANGEA
Reel/Frame 058788/0338 →
Change of Name
Apr 6, 2022
From: K.K.PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 059619/0200 →