IP Library Assignment 015197/0822
Patent Assignment
Reel/Frame 015197/0822

Assignment of Assignor's Interest

Recorded: 2004-09-29 Pages: 4
Assignors
TOWNSEND, III, PAUL H.
Executed: 2003-05-15
MILLS, LYNNE K.
Executed: 2003-05-15
STRITTMATTER, RICHARD J.
Executed: 2003-05-29
Assignee
DOW GLOBAL TECHNOLOGIES INC.
WASHINGTON STREET, 1790 BUILDING, MIDLAND, MICHIGAN, 48674
Covered Properties (2)
Tri-layer masking architecture for patterning dual damascene interconnects
Application: 60/369,489 →
Method of integrating a porous dielectric in an integrated circuit device
Application: 60/369,490 →
Related Assignments (1)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 29, 2004
From: WAETERLOOS, JOOST J. M.
To: DOW BELGIUM B.V.B.A.
Reel/Frame 015197/0908 →