IP Library › Assignment 015335/0195
Patent Assignment
Reel/Frame 015335/0195

Assignment of Assignor's Interest

Recorded: 2004-05-17 Pages: 3
Assignors
IRUMATA, SHUICHI
Executed: 2003-11-25
SUZUKI, RYO
Executed: 2003-12-02
Assignee
NIKKO MATERIALS COMPANY, LIMITED
10-1, TORANOMON 2-CHOME, MINATO-KU, TOKYO 105-8407, JAPAN
Covered Property (1)
Hafnium Silicide Target for Forming Gate Oxide Film and Method for Preparation Thereof
Patent: 7,517,515 →
Application: 10/480,319 →
Publication: US 2004/0170552
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Nov 28, 2006
From: NIKKO MATERIALS CO., LTD.
To: NIPPON MINING & METALS CO., LTD.
Reel/Frame 018555/0221 →
Change of Name/Merger Jun 9, 2011
From: NIPPON MINING & METALS CO., LTD.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 026417/0023 →
Change of Address Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →