IP Library › Assignment 015439/0106
Patent Assignment
Reel/Frame 015439/0106

Assignment of Assignor's Interest

Recorded: 2004-12-08 Pages: 5
Assignors
LAY, CHAO-WEN
Executed: 2004-09-14
HUANG, CHENG-CHIH
Executed: 2004-09-24
Assignee
NANYA TECHNOLOGY CORPORATION
HWA-YA TECHNOLOGY PARK 669, FUHSING 3 RD., KUEISHAN TAOYUAN, TAIWAN
Covered Property (1)
Multi-Layer Gate Stack Structure Comprising a Metal Layer for a Fet Device, and Method for Fabricating the Same
Patent: 7,078,748 →
Application: 10/865,763 →
Publication: US 2005/0275046
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 8, 2004
From: GOLDBACH, MATTHIAS; JAKUBOWSKI, FRANK; KOEPE, RALF; SCHUPKE, KRISTIN
To: INFINEON TECHNOLOGIES AG
Reel/Frame 015439/0215 →
Assignment of Assignor's Interest Mar 11, 2008
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 020627/0141 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →