IP Library › Assignment 015742/0450
Patent Assignment
Reel/Frame 015742/0450

Assignment of Assignor's Interest

Recorded: 2004-08-30 Pages: 4
Assignors
SANDSTROM, TORBJORN
Executed: 2004-08-17
EKBERG, PETER
Executed: 2004-08-17
Assignee
MICRONIC LASER SYSTEMS AB
BOX 3141, NYTORPSVAGEN 9, TABY, SE-183 03, SWEDEN
Covered Property (1)
Method for Error Reduction in Lithography
Patent: 7,444,616 →
Application: 10/827,530 →
Publication: US 2004/0268289
Related Assignments (6)
Other recorded transfers of the patent in this record — the chain of ownership.
License Nov 12, 2008
From: MICRONIC LASER SYSTEMS AB
To: ASML NETHERLANDS B.V.
Reel/Frame 021817/0782 →
Patent Pledge Agreement Nov 12, 2008
From: MICRONIC LASER SYSTEMS AB
To: ASML NETHERLANDS B.V.
Reel/Frame 021820/0822 →
Release of Patent Pledge Agreement Jun 17, 2009
From: MICRONIC LASER SYSTEMS AB
To: ASML NETHERLANDS B.V.
Reel/Frame 022824/0979 →
Release of License Agreement Jun 17, 2009
From: MICRONIC LASER SYSTEMS AB
To: ASML NETHERLANDS B.V.
Reel/Frame 022835/0217 →
Termination of License Agreement Jul 8, 2009
From: ASML NETHERLANDS B.V.
To: MICRONIC LASER SYSTEMS AB (PUBL)
Reel/Frame 022917/0810 →
Release of Patent Pledge Agreement Jul 8, 2009
From: ASML NETHERLANDS B.V.
To: MICRONIC LASER SYSTEMS AB (PUBL)
Reel/Frame 022925/0052 →