Patent Assignment
Reel/Frame 022824/0979
Release of Patent Pledge Agreement
Recorded: 2009-06-17
Received: 2009-06-17
Pages: 6
Assignor
MICRONIC LASER SYSTEMS AB
Executed: 2009-06-12
Assignee
ASML NETHERLANDS B.V.
DE RUN 6501, VELDHOVEN, NLX, 5504 DR, NETHERLANDS
Covered Properties
(43)
Mask blank and a method for producing the same
Application:
10/510,059 →
Method and Apparatus for Patterning a Workpiece and Methods of Manufacturing the Same
Application:
11/008,566 →
Method and Device for Correcting Slm Stamp Image Imperfections
Application:
10/987,589 →
Calibration
Application:
60/623,928 →
Method and Apparatus for Personalization of Semiconductor
Application:
10/953,560 →
Phase-shifting optical maskless lithography enabling ASICs at the 65 and 45 nm nodes
Application:
60/610,012 →
Addressing Method of Movable Elements in a Spatial Light Modulator (Slm)
Application:
10/507,554 →
Healing Algorithm
Application:
10/937,737 →
Bonding Method
Application:
10/488,353 →
Image Forming Method and Apparatus
Application:
10/505,564 →
Pupil improvement/optimization of incoherent imaging systems for improved CD linearity
Application:
60/603,275 →
Psm Alignment Method and Device
Application:
10/911,218 →
Further Method to Pattern a Substrate
Application:
10/911,412 →
Method and Apparatus for Patterning a Workpiece
Application:
10/498,713 →
Method and Apparatus for Image Formation
Application:
10/498,590 →
Method for Error Reduction in Lithography
Application:
10/827,530 →
RET for optical maskless lithography (OML)
Application:
60/552,598 →
RET for optical maskless lithography (OML)
Application:
60/547,614 →
Data Path for High Performance Pattern Generator
Application:
10/782,863 →
Pattern Generator
Application:
10/776,192 →
Phase-shifted addressing
Application:
60/537,887 →
Method and device for data integrity checking
Application:
60/535,106 →
Phase-shifted addressing
Application:
60/529,114 →
Phase-shifted addressing
Application:
60/528,488 →
Dual Layer Workpiece Masking and Manufacturing Process
Application:
10/704,957 →
Defective Pixel Compensation Method
Application:
10/657,526 →
Method to Pattern a Substrate
Application:
10/634,152 →
Methods and Systems for Improved Boundary Contrast
Application:
10/462,010 →
Method for High Precision Printing of Patterns
Application:
10/460,765 →
Pattern Generator Mirror Configurations
Application:
10/449,661 →
Methods and systems for process control of corner feature embellishment
Application:
10/410,874 →
Alignment Sensor
Application:
10/310,637 →
Homogenizer
Application:
10/308,917 →
Method and apparatus of calibrating multi-position SLM elements
Application:
10/238,220 →
Homogenization of a Spatially Coherent Radiation Beam and Printing and Inspection, Respectively, of a Pattern on a Workpiece
Application:
10/238,177 →
Pattern Generation System Using a Spatial Light Modulator
Application:
10/130,070 →
Method and Apparatus for Personalization of Semiconductor
Application:
10/129,364 →
Data Path for High Performance Pattern Generator
Application:
10/049,286 →
Defective Pixel Compensation Method
Application:
09/995,526 →
Reticle and Direct Lithography Writing Strategy
Application:
09/992,653 →
Laser Writer
Application:
09/869,922 →
Graphics Engine for High Precision Lithography
Application:
09/954,721 →
Pattern Generator
Application:
09/824,670 →