IP Library › Patent Application 60610012
Patent Application Provisional Small
App. No. 60/610,012 · Confirmation No. 8252

Phase-shifting optical maskless lithography enabling ASICs at the 65 and 45 nm nodes

Provisional Application Expired
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 Code Description Pages PDF
2004-09-15 TRNA Transmittal of New Application 2 View
2004-09-15 SPEC Specification 23 View
2004-09-15 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
60/610,012
Filed
2004-09-15