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App. No. 11/228,022 · Confirmation No. 6592

Phase-shifting optical maskless lithography enabling asics at the 65 and 45 NM nodes

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2009-07-23 ABN Abandonment 2 View
2008-12-22 CTNF Non-Final Rejection 6 View
2008-12-22 892 List of references cited by examiner 1 View
2008-12-22 SRNT Examiner's search strategy and results 2 View
2008-12-22 SRNT Examiner's search strategy and results 2 View
2008-12-22 SRNT Examiner's search strategy and results 2 View
2008-12-22 SRFW Search information including classification, databases and other search related notes 1 View
2006-09-08 WFEE Fee Worksheet (SB06) 1 View
2005-12-21 WFEE Fee Worksheet (SB06) 1 View
2005-12-06 PEFR Applicant Response to Pre-Exam Formalities Notice 5 View
2005-12-06 OATH Oath or Declaration filed 3 View
2005-12-06 PA.. Power of Attorney 2 View
2005-12-06 ADS Application Data Sheet 4 View
2005-12-06 136A Authorization for Extension of Time all replies 5 View
2005-12-06 CFILE Request for Corrected Filing Receipt 4 View
2005-11-10 A.PE Preliminary Amendment 2 View
2005-11-10 SPEC Specification 1 View
2005-11-10 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2005-10-06 PEFN Pre-Exam Formalities Notice 2 View
2005-09-15 TRNA Transmittal of New Application 1 View
2005-09-15 SPEC Specification 40 View
2005-09-15 CLM Claims 3 View
2005-09-15 ABST Abstract 1 View
2005-09-15 DRW Drawings-only black and white line drawings 15 View
2005-09-15 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
11/228,022
Filed
2005-09-15
Pub. No.
US20060068334A1
Art Unit
1795