IP Library Assignment 015760/0897
Patent Assignment
Reel/Frame 015760/0897

Assignment of Assignor's Interest

Recorded: 2005-02-22 Pages: 5
Assignor
KIM, IN SU
Executed: 2005-02-04
Assignee
DONGBUANAM SEMICONDUCTOR INC.
891-10, DAECHI-DONG,, KANGNAM-KU, SEOUL, 135-523, KOREA, REPUBLIC OF
Covered Property (1)
Method for Forming Silicide Film in Semiconductor Device
Patent: 7,166,526 →
Application: 11/027,141 →
Publication: US 2005/0142826
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 28, 2004
From: KIM, IN SU
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 016148/0753 →
Change of Name May 22, 2006
From: DONGANAM SEMICONDUCTOR INC.
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 017654/0078 →
Corrective Assignment to Correct the Assignor Previously Recorded on Reel 017654 Frame 0078. Assignor(S) Hereby Confirms the Assignor Should Be "Dongbuanam Semiconductor Inc.". Jun 22, 2006
From: DONGBUANAM SEMICONDUCTOR INC.
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 017829/0911 →