IP Library Assignment 015960/0078
Patent Assignment
Reel/Frame 015960/0078

Assignment of Assignor's Interest

Recorded: 2005-03-24 Pages: 4
Assignors
GOTTZEIN, RONALD
Executed: 2004-12-09
BACHMANN, JENS
Executed: 2004-12-09
EFFERENN, DIRK
Executed: 2004-12-09
KAHLER, UWE
Executed: 2004-12-09
LIN, CHUNG-HSIN
Executed: 2004-12-09
LIN, WEN-BIN
Executed: 2004-12-09
DONOHUE, LEE
Executed: 2004-12-09
Assignees
INFINEON TECHNOLOGIES AG
ST. MARTIN STR. 53, MUNICH, 81669, GERMANY
NANYA TECHNOLOGY CORPORATION
HWA-YA TECHNOLOGY, PARK 669, FUHSING 3 RD. KUEISHAN, TAOYUAN, TAIWAN
Covered Property (1)
Process for Removing a Residue from a Metal Structure on a Semiconductor Substrate
Patent: 7,413,993 →
Application: 10/995,025 →
Publication: US 2006/0108324
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 15, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023796/0001 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →