Patent Assignment
Reel/Frame 016026/0756
Translation Certificate
Recorded: 2005-04-07
Pages: 10
Assignor
DONGBU ELECTRONICS CO., LTD.
Executed: 2005-04-04
Assignee
DONGBUANAM SEMICONDUCTOR INC.
891-10 DAECHI-DONG, KANGNAM-KU, SEOUL, 135-523, KOREA, REPUBLIC OF
Covered Properties
(4)
Method for Fabricating Mos Transistors
Method for Forming Short-Channel Transistors
Cmos Image Sensor and Method for Manufacturing the Same
Patent:
6,849,886 →
Application:
10/746,615 →
Method for Preventing the Formation of a Void in a Bottom Anti-Reflective Coating Filling a via Hole
Related Assignments
(5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jul 25, 2003
From: PARK, JEONG HO
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 014334/0298 →
Assignment of Assignor's Interest
Jul 25, 2003
From: KIM, TAE WOO
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 014342/0151 →
Assignment of Assignor's Interest
Dec 23, 2003
From: HAN, CHANG HUN
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 014850/0480 →
Assignment of Assignor's Interest
Oct 20, 2004
From: CHOI, YONG JUN
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 015921/0266 →
Change of Name
May 15, 2006
From: DONGBUANAM SEMICONDUCTOR INC.
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 017616/0966 →