IP Library › Assignment 016349/0696
Patent Assignment
Reel/Frame 016349/0696

Assignment of Assignor's Interest

Recorded: 2005-03-02 Pages: 2
Assignors
ISHIMURA, HIROAKI
Executed: 2005-02-21
YOSHIOKA, KEN
Executed: 2005-02-21
ABE, TAKAHIRO
Executed: 2005-02-21
SAITO, GO
Executed: 2005-02-21
YOSHIGAI, MOTOHIKO
Executed: 2005-02-21
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-14 NISHI SHIMBASHI, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Method and Plasma Processing Apparatus
Patent: 7,224,568 →
Application: 11/069,551 →
Publication: US 2006/0171093
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →