IP Library Assignment 016390/0841
Patent Assignment
Reel/Frame 016390/0841

Assignment of Assignor's Interest

Recorded: 2005-03-24 Pages: 2
Assignor
KAITO, TAKASHI
Executed: 2005-02-21
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Gas Blowing Nozzle of Charged Particle Beam Apparatus and Charged Particle Beam Apparatus as Well as Working Method
Patent: 7,235,783 →
Application: 11/048,962 →
Publication: US 2005/0167614
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →