Gas blowing nozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method
View Patent ↗There are provided a gas blowing nozzle adapted such that, by the fact that a groove-like notch structure has been provided in a side to which a beam IB comes flying in a nozzle tip part of a gas gun used on the occasion of a beam assist deposition or a beam assist etching, the beam IB can pass through an inside of the notch structure, and a charged particle beam apparatus having the gas blowing nozzle 11 as well as a working method.
1. A gas blowing nozzle of a charged particle beam apparatus, the gas blowing nozzle having a passage in a side portion thereof through which a charged particle beam passes during use of the gas blowing nozzle.
2. A gas blowing nozzle of a charged particle beam apparatus according to claim 1 ; wherein the passage is a notch structure provided in the side portion of the gas blowing nozzle such that the charged particle beam passes through an inside of the notch structure.
3. A gas blowing nozzle of a charged particle beam apparatus according to claim 2 ; wherein the notch structure is a groove, that extends lengthwise in a nozzle longitudinal direction.
4. A gas blowing nozzle of a charged particle beam apparatus according to claim 3 ; wherein a width of the groove is smaller than a nozzle inner diameter, and a length of the groove has a value obtained by adding about ½ of a notch width to a distance from a nozzle tip to a peak position of a gas blowing density.
5. A charged particle beam apparatus comprising:
a gas blowing nozzle of a charged particle beam apparatus as set forth in claim 3 ,
a sample stage disposed below the gas blowing nozzle for mounting a sample,
a movement mechanism capable of moving the sample stage in X and Y directions parallel to a sample face,
a beam source disposed above the sample stage for irradiating a charged particle beam toward the sample,
a focusing optical system disposed between the beam source and the sample stage and that focuses the charged particle beam onto the sample near the gas blowing nozzle, and
a secondary charged particle detector that detects secondary charged particles emitted from the sample.
6. A charged particle beam apparatus comprising:
a gas blowing nozzle of a charged particle beam apparatus as set forth in claim 4 ,
a sample stage disposed below the gas blowing nozzle for mounting a sample,
a movement mechanism capable of moving the sample stage in X and Y directions parallel to a sample face,
a beam source disposed above the sample stage for irradiating a charged particle beam toward the sample,
a focusing optical system disposed between the beam source and the sample stage and that focuses the charged particle beam onto the sample near the gas blowing nozzle, and
a secondary charged particle detector that detects secondary charged particles emitted from the sample.
7. A charged particle beam apparatus comprising:
a gas blowing nozzle of a charged particle beam apparatus as set forth in claim 2 ,
a sample stage disposed below the gas blowing nozzle for mounting a sample,
a movement mechanism capable of moving the sample stage in X and Y directions parallel to a sample face,
a beam source disposed above the sample stage for irradiating a charged particle beam toward the sample,
a focusing optical system disposed between the beam source and the sample stage and that focuses the charged particle beam onto the sample near the gas blowing nozzle, and
a secondary charged particle detector that detects secondary charged particles emitted from the sample.
8. A charged particle beam apparatus comprising:
a gas blowing nozzle of a charged particle beam apparatus as set forth in claim 1 ,
a sample stage disposed below the gas blowing nozzle for mounting a sample,
a movement mechanism capable of moving the sample stage in X and Y directions parallel to a sample face,
a beam source disposed above the sample stage for irradiating a charged particle beam toward the sample,
a focusing optical system disposed between the beam source and the sample stage and that focuses the charged particle beam onto the sample near the gas blowing nozzle, and
a secondary charged particle detector that detects secondary charged particles emitted from the sample.
9. In a charged particle beam apparatus that irradiates a focused charged particle beam onto a sample: a gas blowing nozzle that directs a gas toward the sample at a region thereof being irradiated by the focused charged particle beam, the gas blowing nozzle extending into the path of the focused charged particle beam and having a passage aligned with the path and through which the focused charged particle beam passes before reaching the sample.
10. A charged particle beam apparatus according to claim 9 ; wherein the passage comprises a slot formed in a sidewall of the nozzle.
11. A charged particle beam apparatus according to claim 10 ; wherein the slot extends lengthwise along the nozzle.
12. A charged particle beam apparatus according to claim 11 ; wherein the slot terminates at one end near a tip of the nozzle.
13. A charged particle beam apparatus according to claim 12 ; wherein the one end of the slot terminates at and opens into the interior of the nozzle.
14. A charged particle beam apparatus according to claim 9 ; wherein the passage extends in a lengthwise direction along the nozzle.
15. A charged particle beam apparatus according to claim 14 ; wherein the passage terminates at one end near a tip of the nozzle.
16. A charged particle beam apparatus according to claim 15 ; wherein the one end of the passage terminates at and opens into the interior of the nozzle.