IP Library Assignment 016646/0692
Patent Assignment
Reel/Frame 016646/0692

Assignment of Assignor's Interest

Recorded: 2005-08-18 Pages: 3
Assignors
SATO, NORIYOSHI
Executed: 2005-07-28
TANIGUCHI, TAKESHI
Executed: 2005-07-30
MASE, HIROSHI
Executed: 2005-07-30
FUJII, SHUITSU
Executed: 2005-08-07
FUJIWARA, TAMIYA
Executed: 2005-08-12
Assignees
HITACHI KOKUSAI ELECTRIC INC.
14-20 HIGASHI-NAKANO 3-CHOME, NAKANO-KU, TOKYO 164-8511, JAPAN
ADTEC PLASMA TECHNOLOGY CO., LTD.
5-6-10, HIKINO-CHO, FUKUYAMA-SHI, HIROSHIMA 721-0942, JAPAN
NORIYOSHI SATO
4-17-113, KADAN, AOBA-KU, SENDAI-SHI, MIYAGI 980-0815, JAPAN
HIROSHI MASE
5-3, TAKASUZU-CHO 5-CHOME, HITACHI-SHI, IBARAKI 317-0066, JAPAN
TAMIYA FUJIWARA
16-2, NISHI-AOYAMA 2-CHOME, MORIOKA-SHI, IWATE 020-0132, JAPAN
Covered Property (1)
Plasma Generator, Ozone Generator, Substrate Processing Apparatus and Manufacturing Method of Semiconductor Device
Patent: 7,514,377 →
Application: 10/539,569 →
Publication: US 2006/0189168
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Apr 1, 2019
From: HITACHI KOKUSAI ELECTRIC INC.
To: KOKUSAI ELECTRIC CORPORATION
Reel/Frame 048756/0699 →
Assignment of Assignor's Interest Apr 25, 2019
From: HITACHI KOKUSAI ELECTRIC INC.
To: KOKUSAI ELECTRIC CORPORATION
Reel/Frame 049008/0028 →